Design Considerations for Mask Projection Microstereolithography Systems

Date
2013
Authors
Lambert, Phillip M.
Campaigne, Earl A. III
Williams, Christopher B.
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Publisher
University of Texas at Austin
Abstract

Mask projection microstereolithography (MPµSL) uses a dynamic mask and focusing optics to digitally pattern UV light and selectively cure entire layers of photopolymer resin. These systems have been shown to be capable of creating parts with features smaller than 10µm. In this paper, the authors analyze existing MPµSL systems using functional decomposition. Within the context of a morphological matrix, these systems’ design embodiment decisions are compared and the resulting performance tradeoffs are quantified. These embodiment decisions include the dynamic mask, UV light source, projection orientation, and supporting optics. The aim of this work is to provide a design guide for the realization of future MPµSL systems.

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