Quantifying Dimensional Accuracy of a Mask Projection Micro Stereolithography System

Mask Projection Microstereolithography is capable for fabricating true three-dimensional microparts and hence, holds promise as a potential micro-fabrication process for micro-machine components. In this paper, the Mask Projection Micro-Stereolithography (MPµSLA) system developed at the Rapid Prototyping and Manufacturing Institute at Georgia Institute of Technology is presented. The dimensional accuracy of the system is improved by reducing its process planning errors. To this effect, the MPµSLA process is mathematically modeled. In this paper, the irradiance received by the resin surface is modeled as a function of the imaging system parameters and the pattern displayed on the dynamic mask. The resin used in the system is characterized to experimentally determine its working curve. This work enables us to compute the dimensions of a single layer cured using our system. The analytical model is validated by curing test layers on the system. The model computes layer dimensions within 5% error.