Gas Phase SFF Control System for Silicon Nitride Deposition by SALD/SALDV
Abstract
: A closed-loop laser scanning and temperature control system has been developed for
SALD/SALDVI. Temperature control is especially important in SALD/SALDVI because
temperature plays a defining role in both composition and deposition rate. The control system for
SALD/SALDVI is presented which provides .STL file interpretation, real time temperature
control, and laser response modeling, all on a PC. This control system was utilized with the
SALD/SALDVI techniques for depositing silicon nitride. Characteristics of ShN4 fabricated
shapes are discussed, including composition, morphology, and electrical properties.