Gas Phase SFF Control System for Silicon Nitride Deposition by SALD/SALDV

Abstract

: A closed-loop laser scanning and temperature control system has been developed for SALD/SALDVI. Temperature control is especially important in SALD/SALDVI because temperature plays a defining role in both composition and deposition rate. The control system for SALD/SALDVI is presented which provides .STL file interpretation, real time temperature control, and laser response modeling, all on a PC. This control system was utilized with the SALD/SALDVI techniques for depositing silicon nitride. Characteristics of ShN4 fabricated shapes are discussed, including composition, morphology, and electrical properties.