Gas Phase SFF Control System for Silicon Nitride Deposition by SALD/SALDV

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dc.creatorHarrison, Shay
dc.creatorCosta, Chris F.
dc.creatorJakubenas, Kevin J.
dc.creatorCrocker, James E.
dc.creatorMarcus, Harris L.
dc.date.accessioned2018-11-29T21:53:28Z
dc.date.available2018-11-29T21:53:28Z
dc.date.issued1997
dc.description.abstract: A closed-loop laser scanning and temperature control system has been developed for SALD/SALDVI. Temperature control is especially important in SALD/SALDVI because temperature plays a defining role in both composition and deposition rate. The control system for SALD/SALDVI is presented which provides .STL file interpretation, real time temperature control, and laser response modeling, all on a PC. This control system was utilized with the SALD/SALDVI techniques for depositing silicon nitride. Characteristics of ShN4 fabricated shapes are discussed, including composition, morphology, and electrical properties.en_US
dc.description.departmentMechanical Engineeringen_US
dc.identifierdoi:10.15781/T2Z893132
dc.identifier.urihttp://hdl.handle.net/2152/70347
dc.language.isoengen_US
dc.relation.ispartof1997 International Solid Freeform Fabrication Symposiumen_US
dc.rights.restrictionOpenen_US
dc.subjectSALDen_US
dc.subjectTMSen_US
dc.titleGas Phase SFF Control System for Silicon Nitride Deposition by SALD/SALDVen_US
dc.typeConference paperen_US

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1997 International Solid Freeform Fabrication Symposium