Browsing by Subject "Si-containing block copolymer"
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Item Block copolymer orientation control using a top-coat surface treatment(The Conference of Photopolymer Science and Technology (CPST), 2012-06) Seshimo, Takehiro; Bates, Christopher M.; Dean, Leon M.; Cushen, Julia D.; Durand, William J.; Maher, Michael J.; Ellison, Christopher J.; Willson, C. GrantDirected self-assembly of Si containing block copolymers (BCP) is a candidate for next generation patterning technology because it enables both high resolution and high etch contrast. Achieving high resolution requires a high x parameter. However, it is often difficult to achieve perpendicular patterns by thermal annealing of BCPs with a lower surface energy block, which tends to align with the air interface. New top surface treatment materials that provide a surface energy between those of the blocks have been developed that enable perpendicular pattern alignment with block copolymers that have a low surface energy block.