Fabricating large area multi-tier nanostructures

dc.contributor.assigneeBoard of Regents, The University of Texas System
dc.creatorSidlgata V. Sreenivasan
dc.creatorOvadia Abed
dc.creatorPraveen Joseph
dc.creatorMichelle Grigas
dc.creatorAkhila Mallavarapu
dc.creatorParas Ajay
dc.date.accessioned2019-10-23T19:29:23Z
dc.date.available2019-10-23T19:29:23Z
dc.date.filed2016-04-19
dc.date.issued2018-04-10
dc.description.abstractMethods for fabricating and replicating self-aligned multi-tier nanoscale structures for a variety of cross-sectional geometries. These methods can utilize a single lithography step whereby the need for alignment and overlay in the process is completely eliminated thereby enabling near-zero overlay error. Furthermore, techniques are developed to use these methods to fabricate self-aligned nanoscale multi-level/multi-height patterns with various shapes for master templates, replica templates and nanoimprint based pattern replication. Furthermore, the templates can be used to pattern multiple levels in a sacrificial polymer resist and achieve pattern transfer of the levels into a variety of substrates to form completed large area nanoelectronic and nanophotonic devices using only one patterning step.
dc.description.departmentBoard of Regents, University of Texas System
dc.identifier.applicationnumber15133007
dc.identifier.patentnumber9941389
dc.identifier.urihttps://hdl.handle.net/2152/76977
dc.identifier.urihttp://dx.doi.org/10.26153/tsw/4066
dc.publisherUnited States Patent and Trademark Office
dc.relation.ispartofUniversity of Texas Patents
dc.relation.ispartofUniversity of Texas Patents
dc.rights.restrictionOpen
dc.rights.restrictionOpen
dc.subject.cpcG02B6/124
dc.subject.cpcG03F7/0002
dc.subject.cpcH01L29/6659
dc.subject.cpcH01L21/0271
dc.subject.cpcH01L21/0337
dc.subject.cpcH01L21/2855
dc.subject.cpcH01L21/30604
dc.subject.cpcH01L21/3081
dc.subject.cpcH01L21/3086
dc.subject.cpcH01L21/31144
dc.subject.cpcH01L21/76224
dc.subject.cpcH01L29/66515
dc.subject.cpcH01L29/6653
dc.subject.cpcH01L29/66545
dc.subject.cpcH01L21/02164
dc.subject.cpcH01L21/0228
dc.subject.cpcH01L28/90
dc.subject.cpcH01L29/665
dc.subject.uspcNo longer published
dc.titleFabricating large area multi-tier nanostructures
dc.typePatent

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