Water-processable photoresist compositions

Simple item page
dc.contributor.assigneeBoard of Regents, The University of Texas System
dc.creatorYamada, Shintaro
dc.creatorWillson, C. Grant
dc.creatorRager, Timo
dc.date.accessioned2019-10-23T21:40:55Z
dc.date.available2019-10-23T21:40:55Z
dc.date.filed2000-08-14
dc.date.issued2002-06-04
dc.description.abstractWater-processable positive-tone photoresists comprising a water-soluble polymer, wherein the polymer contains a heat-labile functional group that renders the polymer insoluble in water or an aqueous base upon heat treatment, and an acid-labile functional group that restores said water or aqueous base solubility to the polymer upon irradiation in the presence of a water-processable photoacid generator, are described. Also described are the methods of making such polymers and photoresists.
dc.description.departmentBoard of Regents, University of Texas System
dc.identifier.applicationnumber9639382
dc.identifier.patentnumber6399273
dc.identifier.urihttps://hdl.handle.net/2152/77274
dc.identifier.urihttp://dx.doi.org/10.26153/tsw/4363
dc.publisherUnited States Patent and Trademark Office
dc.relation.ispartofUniversity of Texas Patents
dc.relation.ispartofUniversity of Texas Patents
dc.rights.restrictionOpen
dc.rights.restrictionOpen
dc.subject.cpcC08F8/12
dc.subject.cpcC08F212/14
dc.subject.cpcC08F122/14
dc.subject.cpcC08F2800/10
dc.subject.cpcC08F2800/20
dc.subject.cpcG03F7/0392
dc.subject.cpcG03F7/039
dc.subject.cpcG03F7/168
dc.subject.cpcG03F7/0045
dc.subject.cpcY10S430/106
dc.subject.cpcY10S430/111
dc.subject.cpcY10S430/12
dc.subject.uspc430/270.1
dc.subject.uspc430/326
dc.subject.uspc430/330
dc.subject.uspc430/905
dc.subject.uspc430/910
dc.subject.uspc430/919
dc.titleWater-processable photoresist compositions
dc.typePatent

Access full-text files

Original bundle

Now showing 1 - 1 of 1
Thumbnail Image
Name:
US6399273.pdf
Size:
2.96 MB
Format:
Adobe Portable Document Format
Download

Collections

University of Texas Patents