High resolution replicas

Access full-text files

Date

1990-11-06

Authors

Brown, R. Malcolm, Jr.
Mizuta, Shun

Journal Title

Journal ISSN

Volume Title

Publisher

United States Patent and Trademark Office

Abstract

Disclosed are improved methods for preparing high resolution replicas for electron microscopic analysis. Replicas are prepared having a resolution capability less than ten angstroms, with structures of even less than five angstroms being readily discernible. Particular aspects of the invention concern the use of a platinum/carbon evaporant to prepare extremely thin replica surfaces which allow the visualization of structures heretofore unresolvable. The replication is performed at high vacuum, on the order of 10.sup.-5 Torr or better, with continuous rotation of the sample to allow for an even distribution of the evaporant. The resultant replica surfaces are on the order of no more than 5 to 10 angstroms thick. The replica technology disclosed herein is applicable to both biological as well as non-biological samples, including tissues, biochemicals, metals and polymers and even computer chips and superconductor surfaces.

Description

Keywords

LCSH Subject Headings

Citation