Show simple item record

dc.contributor.advisorWillson, C. G. (C. Grant), 1939-en
dc.creatorMeiring, Heather Fayeen
dc.date.accessioned2008-08-28T22:41:42Zen
dc.date.available2008-08-28T22:41:42Zen
dc.date.issued2005en
dc.identifierb61122749en
dc.identifier.urihttp://hdl.handle.net/2152/2293en
dc.descriptiontexten
dc.description.abstractMicrochip applications requiring high resolution and high etch resistance often rely on bilayer resist methods, allowing two materials to meet resist requirements instead of one: the planarizing layer is chosen for etch resistance, while the top coat is selected for transparency, patternability, and hard mask functionality. Graft polymerization lithography is a modified single-layer alternative to bilayer approaches. It involves an inert transfer layer spin-coated with photoacid generator onto a substrate and exposed in selected areas to UV radiation. After irradiation, vapor-phase reaction between photo-generated acid and a silicon-containing monomer occurs in the exposed areas, resulting in a grafted polymer that serves as a hard mask. Absorbance issues are greatly reduced as this is a top surface process. In previous work, various silicon-containing monomers were investigated for use as the graft layer, and new criteria for the monomer and transfer layer were introduced that related to the mutual solubility of the two materials. In this work, a new monomer, bis(vinyloxymethyldimethylsilane), was synthesized, characterized and imaged on the original transfer layer polymer. The vii imaging results revealed a need for a new transfer layer polymer with a high glass transition temperature. Sorption and grafting kinetics measurements of the new monomer on three new trial polymers were undertaken, which identified two of the polymers as viable candidates for the transfer layer. Images formed with one of the polymers, poly(N-methoxyphenylmaleimide-co-p-methoxystyrene), showed great improvement over previous results. Process control issues were identified, and suggestions were offered for potentially improving those problems.
dc.format.mediumelectronicen
dc.language.isoengen
dc.rightsCopyright is held by the author. Presentation of this material on the Libraries' web site by University Libraries, The University of Texas at Austin was made possible under a limited license grant from the author who has retained all copyrights in the works.en
dc.subject.lcshMicrolithographyen
dc.subject.lcshPolymersen
dc.titleAdvances in cationic graft polymerization lithographyen
dc.description.departmentChemical Engineeringen
dc.identifier.oclc70965942en
dc.type.genreThesisen
thesis.degree.departmentChemical Engineeringen
thesis.degree.disciplineChemical Engineeringen
thesis.degree.grantorThe University of Texas at Austinen
thesis.degree.levelDoctoralen
thesis.degree.nameDoctor of Philosophyen


Files in this item

Icon

This item appears in the following Collection(s)

Show simple item record