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    Synthesis of top coat surface treatments for the orientation of thin film block copolymers

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    CHEN-THESIS-2013.pdf (2.363Mb)
    Date
    2013-08
    Author
    Chen, Christopher Hancheng
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    Abstract
    Block copolymer self-assembly has demonstrated sub-optical lithographic resolution . High values of chi, the block copolymer interaction parameter, are required to achieve next-generation lithographic resolution . Unfortunately, high values of chi can lead to thin film orientation control difficulties , which are believed to be caused by large differences in the surface energy of each block relative to the substrate and the free surface. The substrate-block interface can be modified to achieve a surface energy intermediate to that of each individual block ; the air-polymer interface, however, presents additional complications. This thesis describes the synthesis of polymers for top coat surface treatments, which are designed to modify the surface energy of the air-block copolymer interface and enable block copolymer orientation control upon thermal annealing. Polymers with β-keto acid functionality were synthesized to allow polarity switching upon decarboxylation. Syntheses of anhydride containing polymers were established that provide another class of polarity switching materials.
    Department
    Chemistry
    Description
    text
    Subject
    Block copolymer
    Surface treatments
    Directed self assembly
    Polymer synthesis
    Monomer synthesis
    Metal-catalyzed addition polymerization
    Ring opening metathesis polymerization
    Decarboxylation
    Moore's Law
    URI
    http://hdl.handle.net/2152/21487
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    © The University of Texas at Austin