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    Imprint lithography template having a feature size under 250 nm 

    Carlton Willson; John G. Ekerdt; Sidlgata V. Sreenivasan; Matthew E. Colburn; Byung-Jin Choi; Todd C. Bailey (United States Patent and Trademark Office, 2007-06-12)
    The present invention includes a template comprising a plurality of protrusions and a plurality of recessions with a distance between a zenith of any of the plurality of protrusions and a nadir of any one of the plurality ...
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    Device for holding a template for use in imprint lithography 

    Carlton Willson; John G. Ekerdt; Sidlgata V. Sreenivasan; Matthew E. Colburn; Byung-Jin Choi; Todd C. Bailey (United States Patent and Trademark Office, 2010-05-04)
    Described are imprint lithography templates, methods of forming and using the templates, and a template holder device. An imprint lithography template may include a body with a plurality of recesses on a surface of the ...
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    Imprint lithography system to produce light to impinge upon and polymerize a liquid in superimposition with template overlay marks 

    Sidlgata V. Sreenivasan; Matthew E. Colburn; Byung-Jin Choi; Todd C. Bailey (United States Patent and Trademark Office, 2007-12-04)
    The present invention includes an imprint lithography system for impinging a flux of light upon a liquid to polymerize the liquid, the system including, a source of light producing the flux of light; and a template having ...
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    Method of determining alignment of a template and a substrate having a liquid disposed therebetween 

    Sidlgata V. Sreenivasan; Matthew E. Colburn; Byung-Jin Choi; Todd C. Bailey (United States Patent and Trademark Office, 2007-03-06)
    The present invention includes a method of aligning a substrate and a template spaced-apart from the substrate with an activating light curable liquid disposed therebetween, the substrate having substrate alignment marks ...
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    Device for holding a template for use in imprint lithography 

    Carlton Willson; John G. Ekerdt; Sidlgata V. Sreenivasan; Matthew E. Colburn; Byung-Jin Choi; Todd C. Bailey (United States Patent and Trademark Office, 2011-10-11)
    An imprint lithography template may be used to form an imprinted layer in a light curable liquid disposed on a substrate. During use, the template may be disposed within a template holder. The template holder may include ...

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    Author
    Byung-Jin Choi (5)
    Matthew E. Colburn (5)Sidlgata V. Sreenivasan (5)
    Todd C. Bailey (5)
    Carlton Willson (3)John G. Ekerdt (3)SubjectB29C2035/0827 (5)B29C2043/025 (5)B29C35/0888 (5)B29C37/0053 (5)B29C43/003 (5)B82Y10/00 (5)B82Y40/00 (5)G03F7/0002 (5)G03F9/00 (5)425/385 (3)... View MoreDate Issued2007 (3)2010 (1)2011 (1)DepartmentBoard of Regents, University of Texas System (5)Has File(s)Yes (5)

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    © The University of Texas at Austin