Real time imprint process diagnostics for defects
Date
2010-10-19
Authors
Sidlgata V. Sreenivasan
Byung-Jin Choi
Shrawan Singhal
Journal Title
Journal ISSN
Volume Title
Publisher
United States Patent and Trademark Office
Abstract
Defects and/or particles during an imprint lithography process may provide exclusion zones and/or transition zones in the patterned layer. Exclusion zones and/or transition zones in the patterned layer may be identified to provide a region of interest on a template.