Imprint lithography system to produce light to impinge upon and polymerize a liquid in superimposition with template overlay marks
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Date
2007-12-04
Authors
Sidlgata V. Sreenivasan
Matthew E. Colburn
Byung-Jin Choi
Todd C. Bailey
Journal Title
Journal ISSN
Volume Title
Publisher
United States Patent and Trademark Office
Abstract
The present invention includes an imprint lithography system for impinging a flux of light upon a liquid to polymerize the liquid, the system including, a source of light producing the flux of light; and a template having overlay marks being disposed between the liquid and the source of light and being opaque to the flux of light, with a pitch of the overlay marks establishing a polarization of the flux of light such that the flux of light impinges upon and polymerizes the liquid in superimposition with the overlay marks.