Use of Parameter Estimation for Stereolithography Surface Finish Improvement

Access full-text files

Date

2005-08-03

Authors

Sager, Benay
Rosen, David W.

Journal Title

Journal ISSN

Volume Title

Publisher

Abstract

In order to improve Stereolithography (SLA) surface finish, a systematic approach based on estimation of process parameters is needed. In this paper, the exposure on a desired SLA build surface is formulated as a function of process parameters. The deviation of exposure on this surface from the critical exposure, which is the threshold that determines curing in the SLA process, is formulated using least squares minimization. By applying inverse design techniques, SLA process parameters that satisfy this least squares minimization are determined. Application of parameter estimation formulation to important SLA geometries is presented and the results, including surface finish improvement, are discussed.

Description

LCSH Subject Headings

Citation