Optical Threshold Layer And Intermediate State Two-Photon Pag Approaches To Double Exposure Lithography

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dc.contributor.utaustinauthorBerro, Adam J.en
dc.contributor.utaustinauthorGu, Xinyuen
dc.contributor.utaustinauthorNagai, Tomokien
dc.contributor.utaustinauthorOgata, Toshiyukien
dc.contributor.utaustinauthorAdolph, Elizabethen
dc.contributor.utaustinauthorByargeon, Travisen
dc.contributor.utaustinauthorGonzalez, Joseen
dc.contributor.utaustinauthorWillson, C. Granten
dc.creatorBerro, A. J.en
dc.creatorGu, X. Y.en
dc.creatorO'Connor, N.en
dc.creatorJockusch, S.en
dc.creatorNagai, T.en
dc.creatorOgata, T.en
dc.creatorZimmerman, P.en
dc.creatorRice, B. J.en
dc.creatorAdolph, E.en
dc.creatorByargeon, T.en
dc.creatorGonzalez, J.en
dc.creatorTurro, N. J.en
dc.creatorWillson, C. G.en
dc.date.accessioned2015-04-16T13:56:59Zen
dc.date.available2015-04-16T13:56:59Zen
dc.date.issued2009-04en
dc.description.abstractIntermediate state two-photon (ISTP) photoacid generator (PAG) and optical threshold layer (OTL) approaches to double exposure lithography have been explored. We have synthesized >transparent> PAG and sensitizer compounds for use in ISTP systems and have demonstrated the possibility of utilizing such energy transfer systems to generate acid. We have also synthesized side chain liquid crystalline polymers and small molecule azobenzene compounds for use in OTL applications and have begun photoswitching studies.en
dc.description.departmentChemistryen
dc.identifier.citationAdam J. Berro, Xinyu Gu, Naphtali O'Connor, Steffen Jockusch, Tomoki Nagai, Toshiyuki Ogata, Paul Zimmerman, Bryan J. Rice, Elizabeth Adolph, Travis Byargeon, Jose Gonzalez, Nicholas J. Turro, C. Grant Willson. Advances in Resist Materials and Processing Technology XXVI, 72731B (Apr., 2009); doi:10.1117/12.814295en
dc.identifier.doi10.1117/12.814295en
dc.identifier.issn0277-786Xen
dc.identifier.urihttp://hdl.handle.net/2152/29275en
dc.language.isoEnglishen
dc.relation.ispartofserialAdvances in Resist Materials and Processing Technology Xxvien_US
dc.rightsAdministrative deposit of works to UT Digital Repository: This works author(s) is or was a University faculty member, student or staff member; this article is already available through open access or the publisher allows a PDF version of the article to be freely posted online. The library makes the deposit as a matter of fair use (for scholarly, educational, and research purposes), and to preserve the work and further secure public access to the works of the University.en
dc.subjectdouble exposure lithographyen
dc.subjectoptical threshold layeren
dc.subjectintermediate stateen
dc.subjecttwo-photon pagen
dc.subjectliquid crystalline polymeren
dc.subjectazobenzeneen
dc.subjectgas-transporten
dc.subjectbehavioren
dc.subjectpolymersen
dc.subjectmaterials science, multidisciplinaryen
dc.subjectopticsen
dc.subjectphysics, multidisciplinaryen
dc.titleOptical Threshold Layer And Intermediate State Two-Photon Pag Approaches To Double Exposure Lithographyen
dc.typeConference proceedingsen

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