Catalysis and materials development for photolithography

dc.contributor.advisorWillson, C. G. (C. Grant), 1939-en
dc.contributor.committeeMemberKeatinge-Clay, Adrianen
dc.contributor.committeeMemberEllison, Christopheren
dc.contributor.committeeMemberRose, Michaelen
dc.contributor.committeeMemberStevenson, Keithen
dc.creatorMesch, Ryan Alanen
dc.date.accessioned2015-09-11T15:01:08Zen
dc.date.issued2014-08en
dc.date.submittedAugust 2014en
dc.date.updated2015-09-11T15:01:08Zen
dc.descriptiontexten
dc.description.abstractIn recent years the microelectronics industry as found itself at an impasse. The tradition pathway towards smaller transistors at lower costs has hit a roadblock with the failure of 157 nm lithography and the continued delays in 13.5 nm extreme ultra violet light sources. While photolithography has been able to keep pace with Moore’s law over the past four decades, alternative patterning technologies are now required to keep up with market demand. The first section of this dissertation discusses the new resolution enhancement technique develop in the Willson lab termed pitchdivision. Through the incorporation of specifically tailored photobase generators (PBGs) into commercially available resists, the resolution of current 193 tools may be doubled. Special two-stage PBGs were designed and synthesized to increase the image fidelity of pitchdivision patterns. The next project deals with the design, synthesis, and evaluation of resists that find amplification through unzipping polymers. An aromatizing polyester polymer that acts as dissolution inhibitor in novolac and is inherently sensitive to 13.5 nm exposure is discussed. Initial results show excellent sensitivity and promise towards a new class of EUV resists.en
dc.description.departmentChemistryen
dc.format.mimetypeapplication/pdfen
dc.identifier.urihttp://hdl.handle.net/2152/31308en
dc.language.isoenen
dc.subjectLithographyen
dc.subjectPhotochemistryen
dc.subjectPolymeren
dc.subjectEUVen
dc.subjectPhotobase generatoren
dc.subjecti193 lithographyen
dc.subjectTwo-stage photoreactionen
dc.subjectTwo-stage photobase generatoren
dc.subjectKinetically linked photoreactionsen
dc.titleCatalysis and materials development for photolithographyen
dc.typeThesisen
thesis.degree.departmentChemistryen
thesis.degree.disciplineOrganic Chemistryen
thesis.degree.grantorThe University of Texas at Austinen
thesis.degree.levelDoctoralen
thesis.degree.nameDoctor of Philosophyen
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