System and method for improvement of alignment and overlay for microlithography

dc.contributor.assigneeBoard of Regents, The University of Texas System
dc.creatorSidlgata V. Sreenivasan
dc.creatorAnshuman Cherala
dc.creatorKranthimitra Adusumilli
dc.date.accessioned2019-10-23T19:30:53Z
dc.date.available2019-10-23T19:30:53Z
dc.date.filed2005-06-02
dc.date.issued2009-05-19
dc.description.abstractThe present invention provides a method for determining the forces to be applied to a substrate in order to deform the same and correct for overlay misalignment.
dc.description.departmentBoard of Regents, University of Texas System
dc.identifier.applicationnumber11143076
dc.identifier.patentnumber7535549
dc.identifier.urihttps://hdl.handle.net/2152/76995
dc.identifier.urihttp://dx.doi.org/10.26153/tsw/4084
dc.publisherUnited States Patent and Trademark Office
dc.relation.ispartofUniversity of Texas Patents
dc.relation.ispartofUniversity of Texas Patents
dc.rights.restrictionOpen
dc.rights.restrictionOpen
dc.subject.cpcB82Y10/00
dc.subject.cpcB82Y40/00
dc.subject.cpcG03F7/70783
dc.subject.cpcG03F7/0002
dc.subject.cpcG03F7/703
dc.subject.cpcG03F7/70633
dc.subject.cpcG03F9/7003
dc.subject.cpcG03F9/7092
dc.subject.uspc355/52
dc.subject.uspc355/53
dc.subject.uspc355/75
dc.subject.uspc430/22
dc.titleSystem and method for improvement of alignment and overlay for microlithography
dc.typePatent

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