System and method for improvement of alignment and overlay for microlithography

Date
2009-05-19
Authors
Sidlgata V. Sreenivasan
Anshuman Cherala
Kranthimitra Adusumilli
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Publisher
United States Patent and Trademark Office
Abstract

The present invention provides a method for determining the forces to be applied to a substrate in order to deform the same and correct for overlay misalignment.

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