Heat Transfer Analysis of a Gas-Jet Laser Chemical Vapor Deposition (LCVD) Process 461

dc.creatorDuty, Chad E.
dc.creatorFuhrman, Brian T.
dc.creatorJean, Daniel L.
dc.creatorLackey, W. Jack
dc.date.accessioned2019-09-23T17:03:29Z
dc.date.available2019-09-23T17:03:29Z
dc.date.issued2000
dc.description.abstractThis paper describes the development of a computer model used to characterize the heat transfer properties of a gas-jet LCVD process. A commercial software package was used to combine heat transfer finite element analysis with the capabilities of computational fluid dynamic software (CFDS). Such a model is able to account for both conduction and forced convection modes of heat transfer. The maximum substrate temperature was studied as a function of laser power and gas-jet velocity.en_US
dc.description.departmentMechanical Engineeringen_US
dc.identifier.urihttps://hdl.handle.net/2152/75973
dc.identifier.urihttp://dx.doi.org/10.26153/tsw/3072
dc.language.isoengen_US
dc.relation.ispartof2000 International Solid Freeform Fabrication Symposiumen_US
dc.rights.restrictionOpenen_US
dc.subjectDepositionen_US
dc.titleHeat Transfer Analysis of a Gas-Jet Laser Chemical Vapor Deposition (LCVD) Process 461en_US
dc.typeConference paperen_US

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