Heat Transfer Analysis of a Gas-Jet Laser Chemical Vapor Deposition (LCVD) Process 461

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Date

2000

Authors

Duty, Chad E.
Fuhrman, Brian T.
Jean, Daniel L.
Lackey, W. Jack

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Abstract

This paper describes the development of a computer model used to characterize the heat transfer properties of a gas-jet LCVD process. A commercial software package was used to combine heat transfer finite element analysis with the capabilities of computational fluid dynamic software (CFDS). Such a model is able to account for both conduction and forced convection modes of heat transfer. The maximum substrate temperature was studied as a function of laser power and gas-jet velocity.

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