Precision LCVD System Design with Real Time Process Control

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Date

1999

Authors

Jean, Daniel L.
Duty, Chad E.
Fuhrman, Brian T.
Lackey, W. Jack

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Abstract

A Laser Chemical Vapor Deposition (LCVD) system was designed using a fixed 100 Watt C02 laser focused on a moveable substrate. Temperature and height measurement devices monitor the reaction at the point of deposition to provide feedback for controlling the process. The LCVD system will use rapid prototyping technology to directly fabricate fully threedimensional ceramic, metallic, and composite parts of arbitrary shape. Potential applications include high temperature structures, electronic/photonic devices, and orthopaedic implants.

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