Method of varying template dimensions to achieve alignment during imprint lithography

dc.contributor.assigneeBoard of Regents, The University of Texas System
dc.creatorSidlgata V. Sreenivasan
dc.creatorMatthew E. Colburn
dc.creatorTodd Bailey
dc.creatorByung J. Choi
dc.date.accessioned2019-10-23T19:26:22Z
dc.date.available2019-10-23T19:26:22Z
dc.date.filed2003-05-27
dc.date.issued2005-07-12
dc.description.abstractA method of determining and correcting alignment during imprint lithography process is described. During an imprint lithographic process the template may be aligned with the substrate by the use of alignment marks disposed on both the template and substrate. The alignment may be determined and corrected for before the layer is processed.
dc.description.departmentBoard of Regents, University of Texas System
dc.identifier.applicationnumber10446192
dc.identifier.patentnumber6916585
dc.identifier.urihttps://hdl.handle.net/2152/76826
dc.identifier.urihttp://dx.doi.org/10.26153/tsw/3915
dc.publisherUnited States Patent and Trademark Office
dc.relation.ispartofUniversity of Texas Patents
dc.relation.ispartofUniversity of Texas Patents
dc.rights.restrictionOpen
dc.rights.restrictionOpen
dc.subject.cpcB29C35/0888
dc.subject.cpcB29C37/0053
dc.subject.cpcB29C43/003
dc.subject.cpcB29C43/021
dc.subject.cpcB29C2035/0827
dc.subject.cpcB29C2043/025
dc.subject.cpcB82Y10/00
dc.subject.cpcB82Y40/00
dc.subject.cpcG03F7/0002
dc.subject.cpcG03F9/00
dc.subject.cpcY10S101/36
dc.subject.cpcY10T428/24802
dc.subject.uspc430/22
dc.subject.uspc430/30
dc.subject.uspc430/322
dc.titleMethod of varying template dimensions to achieve alignment during imprint lithography
dc.typePatent
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