Advancements in the SIS Process

dc.creatorAsiabanpour, Bahram
dc.creatorKhoshnevis, Behrokh
dc.creatorPalmer, Kurt
dc.creatorMojdeh, Mehdi
dc.date.accessioned2019-11-08T15:30:24Z
dc.date.available2019-11-08T15:30:24Z
dc.date.issued2003
dc.description.abstractSelective Inhibition of Sintering (SIS) is a new layer-based rapid prototyping process. This paper reports the progress in research and development of the SIS process. Specific printer path generation method, experimentation with various powder and inhibitor materials, and systematic models leading to optimum performance given various factors affecting part strength, surface quality, and dimensional accuracy are presented.en_US
dc.description.departmentMechanical Engineeringen_US
dc.identifier.urihttps://hdl.handle.net/2152/78323
dc.identifier.urihttp://dx.doi.org/10.26153/tsw/5410
dc.language.isoengen_US
dc.relation.ispartof2002 International Solid Freeform Fabrication Symposiumen_US
dc.rights.restrictionOpenen_US
dc.subjectSIS Process 25en_US
dc.titleAdvancements in the SIS Processen_US
dc.typeConference paperen_US

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