Lithographic template and method of formation and use

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dc.contributor.assigneeFreescale Semiconductor, Inc.
dc.contributor.assigneeThe Board of Regents of the University of Texas System
dc.creatorCarlton Willson
dc.creatorDouglas J. Resnick
dc.creatorDavid P. Mancini
dc.date.accessioned2019-10-23T19:33:01Z
dc.date.available2019-10-23T19:33:01Z
dc.date.filed2001-12-18
dc.date.issued2005-05-10
dc.description.abstractThis invention relates to a lithographic template, a method of forming the lithographic template and a method for forming devices with the lithographic template. The lithographic template (10, 110, 210) is formed having a substrate (12, 112, 212) and a charge dissipation layer (20, 120, 220), and a patterned imageable relief layer, (16, 116, 216) formed on a surface (14, 114, 214) of the substrate (10, 110, 210) using radiation. The template (10, 110, 210) is used in the fabrication of a semiconductor device (344) for affecting a pattern in the device (344) by positioning (338) the template (10, 11, 210) in close proximity to semiconductor device (344) having a radiation sensitive material (334) formed thereon and applying a pressure (340) to cause the radiation sensitive material to flow into the relief image present on the template (10, 110, 210). Radiation (342) is then applied through the template (10, 110, 210) to cure portions of the radiation sensitive material and define the pattern in the radiation sensitive material. The template (10, 110, 210) is then removed to complete fabrication of semiconductor device (344).
dc.description.departmentBoard of Regents, University of Texas System
dc.identifier.applicationnumber10022489
dc.identifier.patentnumber6890688
dc.identifier.urihttps://hdl.handle.net/2152/77137
dc.identifier.urihttp://dx.doi.org/10.26153/tsw/4226
dc.publisherUnited States Patent and Trademark Office
dc.relation.ispartofUniversity of Texas Patents
dc.relation.ispartofUniversity of Texas Patents
dc.rights.restrictionOpen
dc.rights.restrictionOpen
dc.subject.cpcB82Y10/00
dc.subject.cpcB82Y40/00
dc.subject.cpcG03F7/0002
dc.subject.cpcG03F7/0017
dc.subject.cpcG03F7/093
dc.subject.uspc101/450.1
dc.subject.uspc101/456
dc.subject.uspc101/463.1
dc.subject.uspc216/44
dc.subject.uspc430/5
dc.subject.uspc430/302
dc.subject.uspc430/309
dc.subject.uspc430/310
dc.subject.uspc430/311
dc.subject.uspc430/313
dc.subject.uspc430/527
dc.titleLithographic template and method of formation and use
dc.typePatent

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