Imprint lithography template having a feature size under 250 nm

Date
2007-06-12
Authors
Carlton Willson
John G. Ekerdt
Sidlgata V. Sreenivasan
Matthew E. Colburn
Byung-Jin Choi
Todd C. Bailey
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Volume Title
Publisher
United States Patent and Trademark Office
Abstract

The present invention includes a template comprising a plurality of protrusions and a plurality of recessions with a distance between a zenith of any of the plurality of protrusions and a nadir of any one of the plurality of recessions being less than 250 nm.

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