High precision orientation alignment and gap control stages for imprint lithography processes

Date
2005-03-29
Authors
Sidlgata V. Sreenivasan
Stephen C. Johnson
Byung-Jin Choi
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United States Patent and Trademark Office
Abstract

Processes and associated devices for high precision positioning of a template an substrate during imprint lithography includes a calibration system with a course calibration stage and a fine orientation stage capable of maintaining a uniform gap between the template and substrate. The fine orientation stage includes a pair of flexure members having flexure joints for motion about a pivot point intersected by first and second orientation axes. Actuators lengthen or shorten to expand or contract the flexure members. Separation of the template is achieved using a peel-and-pull method that avoids destruction of imprinted features from the substrate.

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