Engineering block copolymers for advanced lithography

dc.contributor.advisorEllison, Christopher J.
dc.contributor.advisorWillson, C. G. (C. Grant), 1939-
dc.contributor.committeeMemberPaul, Donald R
dc.contributor.committeeMemberFreeman, Benny
dc.contributor.committeeMemberAkinwande, Deji
dc.creatorZhou, Sunshine
dc.date.accessioned2017-06-07T17:37:09Z
dc.date.available2017-06-07T17:37:09Z
dc.date.issued2016-12
dc.date.submittedDecember 2016
dc.date.updated2017-06-07T17:37:09Z
dc.description.abstractBlock copolymer (BCP) nanoimprint lithography is an attractive possible solution for manufacturing hard disk drives with information densities greater than 1 Tbit/in². At these densities, individual bits must be smaller than 10 nm, and BCPs can be engineered to spontaneously self-segregate into features on this size scale. In addition to small feature sizes, industrially relevant BCPs should have simple orientation strategies and possess good etch contrast and resistance. Several silicon-containing BCPs were investigated due to the increased etch contrast and resistance imparted by silicon. The synthesis, characterization, and thin film studies of three silicon-containing BCPs are detailed. Due to the surface energy mismatch between the silicon-containing block and the organic block, solvent annealing and top coats were needed to perpendicularly orient these materials. While these materials possess many advantages, they each have shortcomings that prevent them from being ideal industrial materials. A derivative of poly(styrene-block-methyl methacrylate) was engineered to take advantage of its simple orientation procedure while decreasing the smallest achievable feature size. The synthesis and characterization, including determination of the [chi] parameter, of this BCP are detailed. The thin film assembly of this BCP was also successfully demonstrated, and this dissertation concludes with several ideas for future studies.
dc.description.departmentChemical Engineering
dc.format.mimetypeapplication/pdf
dc.identifierdoi:10.15781/T2WH2DM1K
dc.identifier.urihttp://hdl.handle.net/2152/47128
dc.language.isoen
dc.subjectBlock copolymers
dc.subjectCopolymer
dc.subjectBCP
dc.subjectLithography
dc.subjectNanoimprint
dc.titleEngineering block copolymers for advanced lithography
dc.typeThesis
dc.type.materialtext
thesis.degree.departmentChemical Engineering
thesis.degree.disciplineChemical Engineering
thesis.degree.grantorThe University of Texas at Austin
thesis.degree.levelDoctoral
thesis.degree.nameDoctor of Philosophy

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