Method of separating a template from a substrate during imprint lithography
dc.contributor.assignee | Board of Regents, The University of Texas System | |
dc.creator | Sidlgata V. Sreenivasan | |
dc.creator | Stephen C. Johnson | |
dc.creator | Byung-Jin Choi | |
dc.date.accessioned | 2019-10-23T19:26:19Z | |
dc.date.available | 2019-10-23T19:26:19Z | |
dc.date.filed | 2003-07-10 | |
dc.date.issued | 2005-03-22 | |
dc.description.abstract | Processes and associated devices for high precision positioning of a template an substrate during imprint lithography includes a calibration system with a course calibration stage and a fine orientation stage capable of maintaining a uniform gap between the template and substrate. The fine orientation stage includes a pair of flexure members having flexure joints for motion about a pivot point intersected by first and second orientation axes. Actuators lengthen or shorten to expand or contract the flexure members. Separation of the template is achieved using a peel-and-pull method that avoids destruction of imprinted features from the substrate. | |
dc.description.department | Board of Regents, University of Texas System | |
dc.identifier.applicationnumber | 10617321 | |
dc.identifier.patentnumber | 6870301 | |
dc.identifier.uri | https://hdl.handle.net/2152/76818 | |
dc.identifier.uri | http://dx.doi.org/10.26153/tsw/3907 | |
dc.publisher | United States Patent and Trademark Office | |
dc.relation.ispartof | University of Texas Patents | |
dc.relation.ispartof | University of Texas Patents | |
dc.rights.restriction | Open | |
dc.rights.restriction | Open | |
dc.subject.cpc | B82Y10/00 | |
dc.subject.cpc | B82Y40/00 | |
dc.subject.cpc | G03F9/00 | |
dc.subject.cpc | G03F7/0002 | |
dc.subject.uspc | 101/463.1 | |
dc.subject.uspc | 310/311 | |
dc.subject.uspc | 430/320 | |
dc.title | Method of separating a template from a substrate during imprint lithography | |
dc.type | Patent |
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