Real-Time Selective Monitoring of Exposure Controlled Projection Lithography

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Date

2013

Authors

Jones, Harrison H.
Kwatra, Abhishek
Jariwala, Amit S.
Rosen, David W.

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University of Texas at Austin

Abstract

Exposure Controlled Projection Lithography (ECPL) is a stereolithographic process in which incident radiation, patterned by a dynamic mask, passes through a transparent substrate to cure photopolymer which grows progressively from the substrate surface. We present here a novel method of capturing useful information about the curing process from a simple, inexpensive, real-time monitoring system based on interferometry. This approach can be used to provide feedback control to the ECPL process, thus making the process more robust and increasing system accuracy. The results obtained from this monitoring system provide a means to better visualize and understand the various phenomena occurring during the photopolymerization of transparent photopolymers. In order to lessen the measurement error, caused by internal diffraction within the substrate, the interferometry system has been designed such that the laser light used can be selectively targeted. This selective monitoring approach is experimentally validated to measure the height and profile of the cured part in real-time.

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