Photobase Generator Enabled Pitch Division: A Progress Report

dc.contributor.utaustinauthorCho, Younjinen
dc.contributor.utaustinauthorHagiwara, Yujien
dc.contributor.utaustinauthorMesch, Ryanen
dc.contributor.utaustinauthorOgata, Toshiyukien
dc.contributor.utaustinauthorKim, Taehoen
dc.contributor.utaustinauthorSeshimo, Takehiroen
dc.contributor.utaustinauthorWang, Wadeen
dc.contributor.utaustinauthorWillson, C. Granten
dc.creatorGu, X. Y.en
dc.creatorCho, Y. J.en
dc.creatorKawakami, T.en
dc.creatorHagiwara, Y.en
dc.creatorRawlings, B.en
dc.creatorMesch, R.en
dc.creatorOgata, T.en
dc.creatorKim, T.en
dc.creatorSeshimo, T.en
dc.creatorWang, W. D.en
dc.creatorSundaresan, A. K.en
dc.creatorTurro, N. J.en
dc.creatorGronheid, R.en
dc.creatorBlackwell, J.en
dc.creatorBristol, R.en
dc.creatorWillson, C. G.en
dc.date.accessioned2015-04-16T13:57:04Zen
dc.date.available2015-04-16T13:57:04Zen
dc.date.issued2011-04en
dc.description.abstractPitch division lithography (PDL) with a photobase generator (PBG) allows printing of grating images with twice the pitch of a mask. The proof-of-concept has been published in the previous paper[1, 2] and demonstrated by others[1]. Forty five nm half-pitch (HP) patterns were produced using a 90nm HP mask, but the image had line edge roughness (LER) that does not meet requirements. Efforts have been made to understand and improve the LER in this process. Challenges were summarized toward low LER and good performing pitch division. Simulations and analysis showed the necessity for an optical image that is uniform in the z direction in order for pitch division to be successful. Two-stage PBGs were designed for enhancement of resist chemical contrast. New pitch division resists with polymer-bound PAGs and PBGs, and various PBGs were tested. This paper focuses on analysis of the LER problems and efforts to improve patterning performance in pitch division lithography.en
dc.description.departmentChemical Engineeringen
dc.identifier.citationXinyu Gu, Younjin Cho, Takanori Kawakami, Yuji Hagiwara, Brandon Rawlings, Ryan Mesch, Toshiyuki Ogata, Taeho Kim, Takehiro Seshimo, Wade Wang, Arun K. Sundaresan, Nicholas J. Turro, Roel Gronheid, James Blackwell, Robert Bristol, C. Grant Willson. Advances in Resist Materials and Processing Technology XXVIII, 79720F (Apr., 2011); doi:10.1117/12.879861en
dc.identifier.doi10.1117/12.879861en
dc.identifier.issn0277-786Xen
dc.identifier.urihttp://hdl.handle.net/2152/29280en
dc.language.isoEnglishen
dc.relation.ispartofserialAdvances in Resist Materials and Processing Technology Xxviiien_US
dc.rightsAdministrative deposit of works to UT Digital Repository: This works author(s) is or was a University faculty member, student or staff member; this article is already available through open access or the publisher allows a PDF version of the article to be freely posted online. The library makes the deposit as a matter of fair use (for scholarly, educational, and research purposes), and to preserve the work and further secure public access to the works of the University.en
dc.subjectpitch divisionen
dc.subjectphotobase generatoren
dc.subjectpbgen
dc.subjectpolymer bound pagen
dc.subjectpolymeren
dc.subjectbound pbgen
dc.subjecttwo-stage pbgen
dc.subjectnon-uniform imageen
dc.subjectacid diffusionen
dc.subjectbaseen
dc.subjectdiffusionen
dc.subjectchemically amplified resisten
dc.subjectacid-diffusionen
dc.subjectlithographyen
dc.subjectpagsen
dc.subjectopticsen
dc.titlePhotobase Generator Enabled Pitch Division: A Progress Reporten
dc.typeConference proceedingsen

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