Anhydride copolymer top coats for orientation control of thin film block copolymers

Date
2015-10-13
Authors
Carlton Willson
Takehiro Seshimo
Christopher John Ellison
Christopher M. Bates
Julia Cushen
Logan J. Santos
Leon Dean
Erica L. Rausch
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Publisher
United States Patent and Trademark Office
Abstract

Random copolymer top coats are described that can be spin coated onto block copolymer thin films and used to control the interfacial energy of the top coat-block copolymer interface. The top coats are soluble in aqueous weak base and can change surface energy once they are deposited onto the block copolymer thin film. The use of self-assembled block copolymers to produce advanced lithographic patterns relies on their orientation control in thin films.

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