Issues in Process Planning for Laser Chemical Vapor Deposition

dc.creatorPark, Jae-hyoung
dc.creatorRosen, David W.
dc.date.accessioned2019-10-23T15:27:22Z
dc.date.available2019-10-23T15:27:22Z
dc.date.issued2002
dc.description.abstractLaser Chemical Vapor Deposition (LCVD) is a promising rapid prototyping and manufacturing process that deposits metals and ceramics by local heating of a substrate with a laser. Even though many LCVD process planning characteristics are shared with those of more common Solid Freeform Fabrication (SFF) technologies, LCVD process planning requires new efforts due to its unique characteristics. Unlike a conventional Layered Manufacturing (LM) technology that only builds a planar layer, LCVD can build conformal layers (conform to nonplanar substrates), thin walls, and fibers (rod-shape). This paper explores process planning issues for LCVD in the context of its unique characteristics.en_US
dc.description.departmentMechanical Engineeringen_US
dc.description.sponsorshipWe gratefully acknowledge funding from NSF, grant DMI-0070429, and the support of the member companies of the Georgia Tech Rapid Prototyping & Manufacturing Institute.en_US
dc.identifier.urihttps://hdl.handle.net/2152/76762
dc.identifier.urihttp://dx.doi.org/10.26153/tsw/3851
dc.language.isoengen_US
dc.relation.ispartof2002 International Solid Freeform Fabrication Symposiumen_US
dc.rights.restrictionOpenen_US
dc.subjectVapor Depositionen_US
dc.titleIssues in Process Planning for Laser Chemical Vapor Depositionen_US
dc.typeConference paperen_US

Access full-text files

Original bundle

Now showing 1 - 1 of 1
Loading...
Thumbnail Image
Name:
2002-35-Park.pdf
Size:
164.21 KB
Format:
Adobe Portable Document Format
Description:

License bundle

Now showing 1 - 1 of 1
No Thumbnail Available
Name:
license.txt
Size:
1.64 KB
Format:
Item-specific license agreed upon to submission
Description: