High-resolution overlay alignment methods for imprint lithography

Date
2005-07-26
Authors
Sidlgata V. Sreenivasan
Matthew E. Colburn
Todd Bailey
Byung J. Choi
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Publisher
United States Patent and Trademark Office
Abstract

A method of determining and correcting alignment during imprint lithography process is described. During an imprint lithographic process the template may be aligned with the substrate by the use of alignment marks disposed on both the template and substrate. The alignment may be determined and corrected for before the layer is processed.

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