Dual wavelength method of determining a relative position of a substrate and a template

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Date

2005-06-07

Authors

Sidlgata V. Sreenivasan
Matthew E. Colburn
Todd Bailey
Byung J. Choi

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Publisher

United States Patent and Trademark Office

Abstract

The present invention includes a method of determining a relative position of a substrate and a template spaced-apart therefrom, the substrate having substrate alignment marks disposed thereon and the template having template alignment marks disposed thereon, the method including, impinging first and second fluxes of light upon the substrate and template alignment marks, with the substrate and template alignment marks being responsive to the first flux of light defining a first response, and being responsive to the second flux of light defining a second response differing from the first response; and processing the first and second responses to form a focused image of the substrate and template alignment marks on a common plane, with the focused image indicating the relative position of the substrate and the template.

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