Polylactide/silicon-containing block copolymers for nanolithography

dc.contributor.assigneeBoard of Regents, The University of Texas System
dc.creatorCarlton Willson
dc.creatorChristopher John Ellison
dc.creatorChristopher M. Bates
dc.creatorJulia Cushen
dc.date.accessioned2019-10-23T14:33:22Z
dc.date.available2019-10-23T14:33:22Z
dc.date.filed2013-02-07
dc.date.issued2015-09-01
dc.description.abstractA diblock copolymer system that self-assembles at very low molecular weights to form very small features is described. One polymer in the block copolymer contains silicon, and the other polymer is a polylactide. The block copolymer may be synthesized by a combination of anionic and ring opening polymerization reactions. This block copolymer may form nanoporous materials that can be used as etch masks in lithographic patterning.
dc.description.departmentBoard of Regents, University of Texas System
dc.identifier.applicationnumber13761763
dc.identifier.patentnumber9120117
dc.identifier.urihttps://hdl.handle.net/2152/76680
dc.identifier.urihttp://dx.doi.org/10.26153/tsw/3769
dc.publisherUnited States Patent and Trademark Office
dc.relation.ispartofUniversity of Texas Patents
dc.relation.ispartofUniversity of Texas Patents
dc.rights.restrictionOpen
dc.rights.restrictionOpen
dc.subject.cpcB05C21/005
dc.subject.cpcB05D1/005
dc.subject.cpcB05D3/00
dc.subject.cpcB05D5/00
dc.subject.cpcB82Y10/00
dc.subject.cpcB82Y40/00
dc.subject.cpcC08F8/02
dc.subject.cpcC08F112/14
dc.subject.cpcC08G63/6952
dc.subject.cpcC08F2810/40
dc.subject.cpcC09D167/00
dc.subject.cpcG03F7/0002
dc.subject.cpcY10T428/24851
dc.subject.cpcY10T428/31504
dc.subject.uspcNo longer published
dc.titlePolylactide/silicon-containing block copolymers for nanolithography
dc.typePatent

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