Polylactide/silicon-containing block copolymers for nanolithography

Access full-text files

Date

2015-09-01

Authors

Carlton Willson
Christopher John Ellison
Christopher M. Bates
Julia Cushen

Journal Title

Journal ISSN

Volume Title

Publisher

United States Patent and Trademark Office

Abstract

A diblock copolymer system that self-assembles at very low molecular weights to form very small features is described. One polymer in the block copolymer contains silicon, and the other polymer is a polylactide. The block copolymer may be synthesized by a combination of anionic and ring opening polymerization reactions. This block copolymer may form nanoporous materials that can be used as etch masks in lithographic patterning.

Description

Keywords

LCSH Subject Headings

Citation