Fabricating large area multi-tier nanostructures

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Date

2018-05-15

Authors

Sidlgata V. Sreenivasan
Ovadia Abed
Praveen Joseph
Michelle Grigas
Akhila Mallavarapu
Paras Ajay

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United States Patent and Trademark Office

Abstract

Methods for fabricating and replicating self-aligned multi-tier nanoscale structures for a variety of cross-sectional geometries. These methods can utilize a single lithography step whereby the need for alignment and overlay in the process is completely eliminated thereby enabling near-zero overlay error. Furthermore, techniques are developed to use these methods to fabricate self-aligned nanoscale multi-level/multi-height patterns with various shapes for master templates, replica templates and nanoimprint based pattern replication. Furthermore, the templates can be used to pattern multiple levels in a sacrificial polymer resist and achieve pattern transfer of the levels into a variety of substrates to form completed large area nanoelectronic and nanophotonic devices using only one patterning step.

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