Water-processable photoresist compositions
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Date
2002-06-04
Authors
Yamada, Shintaro
Willson, C. Grant
Rager, Timo
Journal Title
Journal ISSN
Volume Title
Publisher
United States Patent and Trademark Office
Abstract
Water-processable positive-tone photoresists comprising a water-soluble polymer, wherein the polymer contains a heat-labile functional group that renders the polymer insoluble in water or an aqueous base upon heat treatment, and an acid-labile functional group that restores said water or aqueous base solubility to the polymer upon irradiation in the presence of a water-processable photoacid generator, are described. Also described are the methods of making such polymers and photoresists.