System and method for improvement of alignment and overlay for microlithography
Access full-text files
Date
2009-05-19
Authors
Sidlgata V. Sreenivasan
Anshuman Cherala
Kranthimitra Adusumilli
Journal Title
Journal ISSN
Volume Title
Publisher
United States Patent and Trademark Office
Abstract
The present invention provides a method for determining the forces to be applied to a substrate in order to deform the same and correct for overlay misalignment.