Compositions for dark-field polymerization and method of using the same for imprint lithography processes
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Date
2008-04-29
Authors
Stacey, Nicholas A.
Willson, C. Grant
Journal Title
Journal ISSN
Volume Title
Publisher
United States Patent and Trademark Office
Abstract
A composition is provided and a method of using the same to form a pattern on a substrate using imprint lithography employing dark-field polymerization is disclosed. The composition includes a polymerizable bisvinylether and an initiator that produces an acid in response to radiation.