Method of automatic fluid dispensing for imprint lithography processes
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Date
2015-12-29
Authors
Carlton Willson
John G. Ekerdt
Sidlgata V. Sreenivasan
Matthew E. Colburn
Byung-Jin Choi
Todd C. Bailey
Journal Title
Journal ISSN
Volume Title
Publisher
United States Patent and Trademark Office
Abstract
Disclosed herein is an automatic fluid dispensing method and system for dispensing fluid on the surface of a plate-like material, or substrate, including a semiconductor wafer for imprint lithography processes. The dispensing method uses fluid dispenser and a substrate stage that may generate relative lateral motions between a fluid dispenser tip a substrate. Also described herein are methods and devices for creating a planar surface on a substrate using a substantially unpatterned planar template.