Functional nanoparticles
Access full-text files
Date
2015-02-24
Authors
Sidlgata V. Sreenivasan
Frank Y. Xu
Vikramjit Singh
Shuqiang Yang
Journal Title
Journal ISSN
Volume Title
Publisher
United States Patent and Trademark Office
Abstract
Functional nanoparticles may be formed using at least one nano-lithography step. In one embodiment, sacrificial material may be patterned on a multi-layer substrate using an imprint lithography system. The pattern may be further etched into the multi-layer substrate. Functional material may then be deposited on multi-layer substrate and solidified. At least a portion of the functional material may then be removed to provide a crown surface exposing pillars. Pillars may be removed from multi-layer substrate forming functional nanoparticles.