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dc.creatorSidlgata V. Sreenivasan
dc.creatorAvinash Panga
dc.date.accessioned2019-10-23T14:01:58Z
dc.date.available2019-10-23T14:01:58Z
dc.date.issued2013-03-12
dc.identifier.urihttps://hdl.handle.net/2152/76373
dc.identifier.urihttp://dx.doi.org/10.26153/tsw/3462
dc.description.abstractAdaptive imprint planarization provides a surface having desired shape characteristics. Generally, topography of a first surface is mapped to provide a density map. The density map is evaluated to provide a drop pattern for dispensing polymerizable material on the first surface. The polymerizable material is solidified and etched to provide a second surface having the desired shape characteristics. Additionally, adaptive imprint planarization compensates for parasitic effects of the imprinting process.
dc.publisherUnited States Patent and Trademark Office
dc.relation.ispartofUniversity of Texas Patents
dc.relation.ispartofUniversity of Texas Patents
dc.titleAdaptive nanotopography sculpting
dc.typePatent
dc.description.departmentBoard of Regents, University of Texas System
dc.rights.restrictionOpen
dc.rights.restrictionOpen
dc.contributor.assigneeBoard of Regents, The University of Texas System
dc.date.filed2009-06-05
dc.subject.cpcB82Y10/00
dc.subject.cpcB82Y40/00
dc.subject.cpcG03F7/0002
dc.subject.cpcG03F7/70483
dc.identifier.patentnumber8394282
dc.identifier.applicationnumber12479200
dc.subject.uspc216/42
dc.subject.uspc216/38
dc.subject.uspc216/44
dc.subject.uspc216/49
dc.subject.uspc216/52
dc.subject.uspc347/1
dc.subject.uspc347/14
dc.subject.uspc347/54
dc.subject.uspc347/74
dc.subject.uspc438/694
dc.subject.uspc438/697
dc.subject.uspc438/759


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