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    Now showing items 31-40 of 74

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    Adaptive nanotopography sculpting 

    Sidlgata V. Sreenivasan; Avinash Panga (United States Patent and Trademark Office, 2013-03-12)
    Adaptive imprint planarization provides a surface having desired shape characteristics. Generally, topography of a first surface is mapped to provide a density map. The density map is evaluated to provide a drop pattern ...
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    Compositions for dark-field polymerization and method of using the same for imprint lithography processes 

    Carlton Willson; Nicholas A. Stacey (United States Patent and Trademark Office, 2011-03-15)
    The present invention provides a composition and a method of using the same to form a pattern on a substrate using imprint lithography employing dark-field polymerization. To that end, the composition includes a bis vinyl ...
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    Fabricating large area multi-tier nanostructures 

    Sidlgata V. Sreenivasan; Ovadia Abed; Praveen Joseph; Michelle Grigas; Akhila Mallavarapu; Paras Ajay (United States Patent and Trademark Office, 2018-05-15)
    Methods for fabricating and replicating self-aligned multi-tier nanoscale structures for a variety of cross-sectional geometries. These methods can utilize a single lithography step whereby the need for alignment and overlay ...
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    Patterning of non-convex shaped nanostructures 

    Sidlgata V. Sreenivasan; Frank Y. Xu; Byung-Jin Choi; Vikramjit Singh (United States Patent and Trademark Office, 2014-09-09)
    Methods of making nano-scale structures with geometric cross-sections, including convex or non-convex cross-sections, are described. The approach may be used to directly pattern substrates and/or create imprint lithography ...
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    Polylactide/silicon-containing block copolymers for nanolithography 

    Carlton Willson; Christopher John Ellison; Christopher M. Bates; Julia Cushen (United States Patent and Trademark Office, 2015-09-01)
    A diblock copolymer system that self-assembles at very low molecular weights to form very small features is described. One polymer in the block copolymer contains silicon, and the other polymer is a polylactide. The block ...
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    Method of creating a turbulent flow of fluid between a mold and a substrate 

    Nicholas A. Stacey; Daniel A. Babbs; Ronald D. Voisin; Duane J. Voth; Frank Y. Xu; Pankaj B. Lad; Ian McMackin; Van N. Truskett; Mathew P. Watts (United States Patent and Trademark Office, 2009-05-12)
    The present invention is directed toward a method of controlling a turbulent flow of a fluid between a substrate and a template, and more specifically, controlling a turbulent flow of a fluid between droplets disposed on ...
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    Method of orientating a template with respect to a substrate in response to a force exerted on the template 

    Sidlgata V. Sreenivasan; Stephen C. Johnson; Byung-Jin Choi (United States Patent and Trademark Office, 2006-06-13)
    The present invention includes a method of orientating a template with respect to a substrate spaced from the template, the method including, rotating the template about a first and a second axis to orientate the template ...
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    Methods for fabricating patterned features utilizing imprint lithography 

    Michael Watts; Nicholas A. Stacey; Frank Y. Xu; Ecron D. Thompson (United States Patent and Trademark Office, 2006-10-17)
    One embodiment of the present invention is a method for generating patterned features on a substrate that includes: (a) forming a first layer on at least a portion of a surface of the substrate, the first layer comprising ...
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    Programmable deposition of thin films of a user-defined profile with nanometer scale accuracy 

    Lawrence R. Dunn; Sidlgata V. Sreenivasan; Shrawan Singhal; Ovadia Abed (United States Patent and Trademark Office, 2017-08-01)
    An inkjet-based process for programmable deposition of thin films of a user-defined profile. Drops of a pre-cursor liquid organic material are dispensed at various locations on a substrate by a multi-jet. A superstrate is ...
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    Flexure based macro motion translation stage 

    Sidlgata V. Sreenivasan; Byung J. Choi (United States Patent and Trademark Office, 2011-09-13)
    Described are flexure-based high precision positioning stages. The stages are constrained to motion along each axis by a system of symmetrical flexure linkages. The linkages may be formed of link coupled by flexure joints. ...
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    AuthorSidlgata V. Sreenivasan (39)Byung-Jin Choi (19)Matthew E. Colburn (15)Carlton Willson (13)C. Grant Willson (11)Christopher John Ellison (9)Christopher M. Bates (8)Frank Y. Xu (7)Stephen C. Johnson (7)Byung J. Choi (6)... View MoreSubject
    G03F7/0002 (74)
    B82Y40/00 (63)B82Y10/00 (60)G03F9/00 (20)B29C2043/025 (19)B29C43/003 (17)No longer published (16)B29C35/0888 (14)B29C2035/0827 (13)B29C37/0053 (13)... View MoreDate Issued2010 - 2019 (39)2002 - 2009 (35)DepartmentBoard of Regents, University of Texas System (74)Has File(s)Yes (74)

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