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System and method for improvement of alignment and overlay for microlithography
(United States Patent and Trademark Office, 2009-05-19)
The present invention provides a method for determining the forces to be applied to a substrate in order to deform the same and correct for overlay misalignment.
Polylactide/silicon-containing block copolymers for nanolithography
(United States Patent and Trademark Office, 2017-12-05)
The present invention includes a diblock copolymer system that self-assembles at very low molecular weights to form very small features. In one embodiment, one polymer in the block copolymer contains silicon, and the other ...
Method to reduce adhesion between a conformable region and a pattern of a mold
(United States Patent and Trademark Office, 2007-01-02)
The present invention provides a method to reduce adhesion between a conformable region on a substrate and a pattern of a mold, which selectively comes into contact with the conformable region. The method features forming ...
Anhydride copolymer top coats for orientation control of thin film block copolymers
(United States Patent and Trademark Office, 2016-04-19)
The use of self-assembled block copolymer structures to produce advanced lithographic patterns relies on control of the orientation of these structures in thin films. In particular, orientation of cylinders and lamellae ...
Step and flash imprint lithography
(United States Patent and Trademark Office, 2002-01-01)
A method of forming a relief image in a structure comprising a substrate and a transfer layer formed thereon comprises covering the transfer layer with a polymerizable fluid composition, and then contacting the polymerizable ...
Real time imprint process diagnostics for defects
(United States Patent and Trademark Office, 2010-10-19)
Defects and/or particles during an imprint lithography process may provide exclusion zones and/or transition zones in the patterned layer. Exclusion zones and/or transition zones in the patterned layer may be identified ...
Imprint lithography system to produce light to impinge upon and polymerize a liquid in superimposition with template overlay marks
(United States Patent and Trademark Office, 2007-12-04)
The present invention includes an imprint lithography system for impinging a flux of light upon a liquid to polymerize the liquid, the system including, a source of light producing the flux of light; and a template having ...
Adaptive shape substrate support method
(United States Patent and Trademark Office, 2009-03-17)
The present method features an active compliant pin chuck to hold a substrate, having opposed first and second surfaces, and compensates for non-planarity in one of the surfaces of the substrate. To that end, the method ...
Method of determining alignment of a template and a substrate having a liquid disposed therebetween
(United States Patent and Trademark Office, 2007-03-06)
The present invention includes a method of aligning a substrate and a template spaced-apart from the substrate with an activating light curable liquid disposed therebetween, the substrate having substrate alignment marks ...
Apparatus to orientate a body with respect to a surface
(United States Patent and Trademark Office, 2005-08-02)
An apparatus to orientate a body with respect to a surface spaced-apart from the body. The apparatus comprises a flexure system having a first flexure member defining a first axis of rotation and a second flexure member ...