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    Method to control the relative position between a body and a surface 

    Sidlgata V. Sreenivasan; Stephen C. Johnson; Byung-Jin Choi (United States Patent and Trademark Office, 2005-10-18)
    A method to control a relative position between a surface and a body to form a pattern in the surface that features moving a body to obtain a desired relationship between the surface and the body. To that end, the method ...
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    Apparatus to control displacement of a body spaced-apart from a surface 

    Sidlgata V. Sreenivasan; Stephen C. Johnson; Byung-Jin Choi (United States Patent and Trademark Office, 2006-08-29)
    An apparatus to control displacement of a body spaced-apart from a surface includes a flexure system having a first flexure member defining a first axis of rotation and a second flexure member defining a second axis of ...
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    Remote center compliant flexure device 

    Sidlgata V. Sreenivasan; Stephen C. Johnson; Byung-Jin Choi (United States Patent and Trademark Office, 2008-10-07)
    An apparatus to control displacement of a body spaced-apart from a surface includes a flexure system having a first flexure member defining a first axis of rotation and a second flexure member defining a second axis of ...
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    High precision orientation alignment and gap control stages for imprint lithography processes 

    Sidlgata V. Sreenivasan; Stephen C. Johnson; Byung-Jin Choi (United States Patent and Trademark Office, 2005-03-29)
    Processes and associated devices for high precision positioning of a template an substrate during imprint lithography includes a calibration system with a course calibration stage and a fine orientation stage capable of ...
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    Imprint lithography template having a feature size under 250 nm 

    Carlton Willson; John G. Ekerdt; Sidlgata V. Sreenivasan; Matthew E. Colburn; Byung-Jin Choi; Todd C. Bailey (United States Patent and Trademark Office, 2007-06-12)
    The present invention includes a template comprising a plurality of protrusions and a plurality of recessions with a distance between a zenith of any of the plurality of protrusions and a nadir of any one of the plurality ...
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    Device for holding a template for use in imprint lithography 

    Carlton Willson; John G. Ekerdt; Sidlgata V. Sreenivasan; Matthew E. Colburn; Byung-Jin Choi; Todd C. Bailey (United States Patent and Trademark Office, 2010-05-04)
    Described are imprint lithography templates, methods of forming and using the templates, and a template holder device. An imprint lithography template may include a body with a plurality of recesses on a surface of the ...
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    Method to reduce adhesion between a conformable region and a pattern of a mold 

    Michael Watts; Nicholas A. Stacey; Frank Y. Xu; Byung-Jin Choi; Van Hong Truskett (United States Patent and Trademark Office, 2007-01-02)
    The present invention provides a method to reduce adhesion between a conformable region on a substrate and a pattern of a mold, which selectively comes into contact with the conformable region. The method features forming ...
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    Real time imprint process diagnostics for defects 

    Sidlgata V. Sreenivasan; Byung-Jin Choi; Shrawan Singhal (United States Patent and Trademark Office, 2010-10-19)
    Defects and/or particles during an imprint lithography process may provide exclusion zones and/or transition zones in the patterned layer. Exclusion zones and/or transition zones in the patterned layer may be identified ...
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    Imprint lithography system to produce light to impinge upon and polymerize a liquid in superimposition with template overlay marks 

    Sidlgata V. Sreenivasan; Matthew E. Colburn; Byung-Jin Choi; Todd C. Bailey (United States Patent and Trademark Office, 2007-12-04)
    The present invention includes an imprint lithography system for impinging a flux of light upon a liquid to polymerize the liquid, the system including, a source of light producing the flux of light; and a template having ...
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    Method of determining alignment of a template and a substrate having a liquid disposed therebetween 

    Sidlgata V. Sreenivasan; Matthew E. Colburn; Byung-Jin Choi; Todd C. Bailey (United States Patent and Trademark Office, 2007-03-06)
    The present invention includes a method of aligning a substrate and a template spaced-apart from the substrate with an activating light curable liquid disposed therebetween, the substrate having substrate alignment marks ...
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    Author
    Byung-Jin Choi (19)
    Sidlgata V. Sreenivasan (18)Stephen C. Johnson (7)Matthew E. Colburn (5)Todd C. Bailey (5)Carlton Willson (4)John G. Ekerdt (4)Shrawan Singhal (2)Stephen C. Johnson (2)Anshuman Cherala (1)... View MoreSubjectB82Y10/00 (19)B82Y40/00 (19)G03F7/0002 (19)G03F9/00 (12)B29C2043/025 (7)425/385 (5)430/30 (5)B29C2035/0827 (5)B29C35/0888 (5)B29C37/0053 (5)... View MoreDate Issued2010 - 2015 (7)2005 - 2009 (12)DepartmentBoard of Regents, University of Texas System (19)Has File(s)Yes (19)

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    • facebook
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