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High-resolution overlay alignment methods for imprint lithography
(United States Patent and Trademark Office, 2005-07-26)
A method of determining and correcting alignment during imprint lithography process is described. During an imprint lithographic process the template may be aligned with the substrate by the use of alignment marks disposed ...
Remote center compliant flexure device
(United States Patent and Trademark Office, 2008-10-07)
An apparatus to control displacement of a body spaced-apart from a surface includes a flexure system having a first flexure member defining a first axis of rotation and a second flexure member defining a second axis of ...
High resolution overlay alignment systems for imprint lithography
(United States Patent and Trademark Office, 2005-07-19)
A system of determining and correcting alignment during imprint lithography process is described. During an imprint lithographic process the template may be aligned with the substrate by the use of alignment marks disposed ...
Method of varying template dimensions to achieve alignment during imprint lithography
(United States Patent and Trademark Office, 2005-07-12)
A method of determining and correcting alignment during imprint lithography process is described. During an imprint lithographic process the template may be aligned with the substrate by the use of alignment marks disposed ...
Step and flash imprint lithography
(United States Patent and Trademark Office, 2002-01-01)
A method of forming a relief image in a structure comprising a substrate and a transfer layer formed thereon comprises covering the transfer layer with a polymerizable fluid composition, and then contacting the polymerizable ...
Imprint lithography system to produce light to impinge upon and polymerize a liquid in superimposition with template overlay marks
(United States Patent and Trademark Office, 2007-12-04)
The present invention includes an imprint lithography system for impinging a flux of light upon a liquid to polymerize the liquid, the system including, a source of light producing the flux of light; and a template having ...
Method of determining alignment of a template and a substrate having a liquid disposed therebetween
(United States Patent and Trademark Office, 2007-03-06)
The present invention includes a method of aligning a substrate and a template spaced-apart from the substrate with an activating light curable liquid disposed therebetween, the substrate having substrate alignment marks ...
Imprint lithography template comprising alignment marks
(United States Patent and Trademark Office, 2005-01-11)
A system of determining and correcting alignment during imprint lithography process is described. During an imprint lithographic process the template may be aligned with the substrate by the use of alignment marks disposed ...
Dual wavelength method of determining a relative position of a substrate and a template
(United States Patent and Trademark Office, 2005-06-07)
The present invention includes a method of determining a relative position of a substrate and a template spaced-apart therefrom, the substrate having substrate alignment marks disposed thereon and the template having ...
Method of aligning a template with a substrate employing moire patterns
(United States Patent and Trademark Office, 2006-01-17)
The present invention includes a method of determining an alignment between a substrate and a template spaced-apart from the substrate and having a distance defined therebetween, the substrate having a first pattern disposed ...