Now showing items 1-3 of 3
Imprint lithography template having a feature size under 250 nm
(United States Patent and Trademark Office, 2007-06-12)
The present invention includes a template comprising a plurality of protrusions and a plurality of recessions with a distance between a zenith of any of the plurality of protrusions and a nadir of any one of the plurality ...
Imprint lithography system to produce light to impinge upon and polymerize a liquid in superimposition with template overlay marks
(United States Patent and Trademark Office, 2007-12-04)
The present invention includes an imprint lithography system for impinging a flux of light upon a liquid to polymerize the liquid, the system including, a source of light producing the flux of light; and a template having ...
Method of determining alignment of a template and a substrate having a liquid disposed therebetween
(United States Patent and Trademark Office, 2007-03-06)
The present invention includes a method of aligning a substrate and a template spaced-apart from the substrate with an activating light curable liquid disposed therebetween, the substrate having substrate alignment marks ...