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    Method to control the relative position between a body and a surface 

    Sidlgata V. Sreenivasan; Stephen C. Johnson; Byung-Jin Choi (United States Patent and Trademark Office, 2005-10-18)
    A method to control a relative position between a surface and a body to form a pattern in the surface that features moving a body to obtain a desired relationship between the surface and the body. To that end, the method ...
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    Anhydride copolymer top coats for orientation control of thin film block copolymers 

    Carlton Willson; Takehiro Seshimo; Christopher John Ellison; Christopher M. Bates; Julia Cushen; Logan J. Santos; Leon Dean; Erica L. Rausch (United States Patent and Trademark Office, 2015-10-13)
    Random copolymer top coats are described that can be spin coated onto block copolymer thin films and used to control the interfacial energy of the top coat-block copolymer interface. The top coats are soluble in aqueous ...
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    Apparatus to control displacement of a body spaced-apart from a surface 

    Sidlgata V. Sreenivasan; Stephen C. Johnson; Byung-Jin Choi (United States Patent and Trademark Office, 2006-08-29)
    An apparatus to control displacement of a body spaced-apart from a surface includes a flexure system having a first flexure member defining a first axis of rotation and a second flexure member defining a second axis of ...
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    High-resolution overlay alignment methods for imprint lithography 

    Sidlgata V. Sreenivasan; Matthew E. Colburn; Todd Bailey; Byung J. Choi (United States Patent and Trademark Office, 2005-07-26)
    A method of determining and correcting alignment during imprint lithography process is described. During an imprint lithographic process the template may be aligned with the substrate by the use of alignment marks disposed ...
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    Functional nanoparticles 

    Sidlgata V. Sreenivasan; Frank Y. Xu; Vikramjit Singh; Shuqiang Yang (United States Patent and Trademark Office, 2015-02-24)
    Functional nanoparticles may be formed using at least one nano-lithography step. In one embodiment, sacrificial material may be patterned on a multi-layer substrate using an imprint lithography system. The pattern may be ...
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    Methods for fabricating nano and microparticles for drug delivery 

    Krishnendu Roy; Li Shi; Luz Cristal Glangchai (United States Patent and Trademark Office, 2015-11-10)
    The present invention generally relates to stimuli-responsive drug carriers and methods for making. More specifically, the present invention relates to stimuli-responsive lidded particles that respond to a physiological ...
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    Remote center compliant flexure device 

    Sidlgata V. Sreenivasan; Stephen C. Johnson; Byung-Jin Choi (United States Patent and Trademark Office, 2008-10-07)
    An apparatus to control displacement of a body spaced-apart from a surface includes a flexure system having a first flexure member defining a first axis of rotation and a second flexure member defining a second axis of ...
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    Substrate support system 

    Sidlgata V. Sreenivasan; Pawan Kumar Nimmakayala (United States Patent and Trademark Office, 2007-07-17)
    The present invention includes a substrate support system that features a chuck body having a body surface with a pin extending therefrom having a contact surface lying in a plane, with the pin being movably coupled to the ...
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    System for creating a turbulent flow of fluid between a mold and a substrate 

    Nicholas A. Stacey; Daniel A. Babbs; Ronald D. Voisin; Duane J. Voth; Frank Y. Xu; Pankaj B. Lad; Ian McMackin; Van N. Truskett; Mathew P. Watts (United States Patent and Trademark Office, 2007-09-18)
    The present invention is directed toward a system for introducing a flow of a fluid between a mold, disposed on a template, and a substrate, the system including, a fluid supply system; and a chuck body having a baffle and ...
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    High resolution overlay alignment systems for imprint lithography 

    Matthew E. Colburn; Todd Bailey; Byung J. Choi; S. V. Sreenivasan (United States Patent and Trademark Office, 2005-07-19)
    A system of determining and correcting alignment during imprint lithography process is described. During an imprint lithographic process the template may be aligned with the substrate by the use of alignment marks disposed ...
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    AuthorSidlgata V. Sreenivasan (32)Byung-Jin Choi (19)Matthew E. Colburn (15)Carlton Willson (13)Frank Y. Xu (7)Stephen C. Johnson (7)Byung J. Choi (6)John G. Ekerdt (6)Nicholas A. Stacey (6)Todd Bailey (6)... View MoreSubject
    B82Y10/00 (60)
    B82Y40/00 (60)
    G03F7/0002 (60)
    G03F9/00 (20)B29C2043/025 (19)B29C43/003 (17)B29C2035/0827 (13)B29C35/0888 (13)B29C37/0053 (13)B29C43/021 (12)... View MoreDate Issued2010 - 2019 (25)2002 - 2009 (35)DepartmentBoard of Regents, University of Texas System (60)Has File(s)Yes (60)

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