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Method to control the relative position between a body and a surface
(United States Patent and Trademark Office, 2005-10-18)
A method to control a relative position between a surface and a body to form a pattern in the surface that features moving a body to obtain a desired relationship between the surface and the body. To that end, the method ...
Apparatus to control displacement of a body spaced-apart from a surface
(United States Patent and Trademark Office, 2006-08-29)
An apparatus to control displacement of a body spaced-apart from a surface includes a flexure system having a first flexure member defining a first axis of rotation and a second flexure member defining a second axis of ...
High-resolution overlay alignment methods for imprint lithography
(United States Patent and Trademark Office, 2005-07-26)
A method of determining and correcting alignment during imprint lithography process is described. During an imprint lithographic process the template may be aligned with the substrate by the use of alignment marks disposed ...
Remote center compliant flexure device
(United States Patent and Trademark Office, 2008-10-07)
An apparatus to control displacement of a body spaced-apart from a surface includes a flexure system having a first flexure member defining a first axis of rotation and a second flexure member defining a second axis of ...
Substrate support system
(United States Patent and Trademark Office, 2007-07-17)
The present invention includes a substrate support system that features a chuck body having a body surface with a pin extending therefrom having a contact surface lying in a plane, with the pin being movably coupled to the ...
System for creating a turbulent flow of fluid between a mold and a substrate
(United States Patent and Trademark Office, 2007-09-18)
The present invention is directed toward a system for introducing a flow of a fluid between a mold, disposed on a template, and a substrate, the system including, a fluid supply system; and a chuck body having a baffle and ...
High resolution overlay alignment systems for imprint lithography
(United States Patent and Trademark Office, 2005-07-19)
A system of determining and correcting alignment during imprint lithography process is described. During an imprint lithographic process the template may be aligned with the substrate by the use of alignment marks disposed ...
High precision orientation alignment and gap control stages for imprint lithography processes
(United States Patent and Trademark Office, 2005-03-29)
Processes and associated devices for high precision positioning of a template an substrate during imprint lithography includes a calibration system with a course calibration stage and a fine orientation stage capable of ...
Lithographic template and method of formation and use
(United States Patent and Trademark Office, 2005-05-10)
This invention relates to a lithographic template, a method of forming the lithographic template and a method for forming devices with the lithographic template. The lithographic template (10, 110, 210) is formed having a ...
Imprint lithography template having a feature size under 250 nm
(United States Patent and Trademark Office, 2007-06-12)
The present invention includes a template comprising a plurality of protrusions and a plurality of recessions with a distance between a zenith of any of the plurality of protrusions and a nadir of any one of the plurality ...